本土量產深紫外光刻系統
上海睿星（Shanghai Aishengna）推出量產型DUV設備
上海艾森娜電子科技集團（Shanghai Aishengna Electronic Technology Group）已開始生產浸潤式深紫外光刻系統，用於在矽晶圓上印製電路圖案。這家由國家支持的上海企業，預計於 2026 年將首批機台交付予中芯國際、華虹半導體及長鑫存儲科技，標誌著中國推動半導體設備國產化的重要一步。
此系統設計旨在支援單次曝光下的 28 納米級圖案製作，並可透過多重圖案化技術，達到更先進的製程節點。初步產能目標仍屬有限，2026 年約為五台，2027 年則預計為 20 台，同時部分關鍵組件仍需依賴國際採購，本地供應商延誤亦已影響產量。
對中國芯片製造商而言，本土化的深紫外光刻設備供應商，有助減少對外國光刻設備的依賴，並強化供應鏈韌性。然而，長遠競爭力仍取決於這些機台能否在大規模生產環境下，於可靠性、產能、良率及服務水平方面，追上成熟系統的表現。
英文原文
Shanghai Aishengna Electronic Technology Group has begun producing immersion deep-ultraviolet lithography systems designed to print circuit patterns onto silicon wafers. The state-backed Shanghai company is expected to deliver its first machines to SMIC, Hua Hong Semiconductor and ChangXin Memory Technologies in 2026, marking a notable step in China’s domestic semiconductor equipment push.
The systems are designed to support 28nm-class patterning in a single exposure and could reach more advanced nodes through multiple patterning. Initial production targets remain limited, at roughly five units in 2026 and 20 in 2027, while some critical components are still sourced internationally and local supplier delays have affected output.
For Chinese chipmakers, a domestic DUV supplier could reduce dependence on foreign lithography equipment and strengthen supply-chain resilience. However, long-term competitiveness will depend on whether the machines can match established systems in reliability, throughput, yield and service at high-volume production scale.
- 來源
- Trend Hunter
- 發布
- 2026-08-09
- 品類
- Inventions
- 出處
- techwireasia